TiAlN and TiAlCN deposition in an industrial PaCVD-plant

D. Heim; R. Hochreiter

doi:10.1016/S0257-8972(97)00303-4

TiAlN and TiAlCN deposition in an industrial PaCVD-plant

D. Heim, R. Hochreiter

Research output: Contribution to journal › Article › peer-review

55 Citations (Scopus)

Abstract

An industrial PaCVD-plant was equipped with an AlQ₃-generator. By using Ar, H₂, N₂, CH₄, TiCl₄ and AlCl₃, TiAlN- and TiAlCN-films could be deposited on hard metal and steel substrates. The plasma was generated by a DC-pulse power supply with frequencies up to 50 kHz. The reactor size was 350 mm in diameter and 900 mm in height. During one batch 1200 indexable inserts could be coated. The growth rates were about 1-3 μm h^-1. The deposited films show a fine structure and Cl-concentrations below 3%. The measured critical loads were between 30 and 40 N. Wear test results show an increase in tool life up to several 100% compared with uncoated or TiN-coated tools.

Original language	English
Pages (from-to)	1553-1556
Number of pages	4
Journal	Surface and Coatings Technology
Volume	98
Issue number	1-3
DOIs	https://doi.org/10.1016/S0257-8972(97)00303-4
Publication status	Published - Jan 1998
Externally published	Yes

Keywords

AlN
Industrial PACVD
Pulsed d.c. plasma
Ti
TiAlCN

Access to Document

10.1016/S0257-8972(97)00303-4

Cite this

@article{ab65a4c6e041465f833dac98e611cfcf,

title = "TiAlN and TiAlCN deposition in an industrial PaCVD-plant",

abstract = "An industrial PaCVD-plant was equipped with an AlQ3-generator. By using Ar, H2, N2, CH4, TiCl4 and AlCl3, TiAlN- and TiAlCN-films could be deposited on hard metal and steel substrates. The plasma was generated by a DC-pulse power supply with frequencies up to 50 kHz. The reactor size was 350 mm in diameter and 900 mm in height. During one batch 1200 indexable inserts could be coated. The growth rates were about 1-3 μm h-1. The deposited films show a fine structure and Cl-concentrations below 3%. The measured critical loads were between 30 and 40 N. Wear test results show an increase in tool life up to several 100% compared with uncoated or TiN-coated tools.",

keywords = "AlN, Industrial PACVD, Pulsed d.c. plasma, Ti, TiAlCN",

author = "D. Heim and R. Hochreiter",

year = "1998",

month = jan,

doi = "10.1016/S0257-8972(97)00303-4",

language = "English",

volume = "98",

pages = "1553--1556",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier",

number = "1-3",

}

TY - JOUR

T1 - TiAlN and TiAlCN deposition in an industrial PaCVD-plant

AU - Heim, D.

AU - Hochreiter, R.

PY - 1998/1

Y1 - 1998/1

N2 - An industrial PaCVD-plant was equipped with an AlQ3-generator. By using Ar, H2, N2, CH4, TiCl4 and AlCl3, TiAlN- and TiAlCN-films could be deposited on hard metal and steel substrates. The plasma was generated by a DC-pulse power supply with frequencies up to 50 kHz. The reactor size was 350 mm in diameter and 900 mm in height. During one batch 1200 indexable inserts could be coated. The growth rates were about 1-3 μm h-1. The deposited films show a fine structure and Cl-concentrations below 3%. The measured critical loads were between 30 and 40 N. Wear test results show an increase in tool life up to several 100% compared with uncoated or TiN-coated tools.

AB - An industrial PaCVD-plant was equipped with an AlQ3-generator. By using Ar, H2, N2, CH4, TiCl4 and AlCl3, TiAlN- and TiAlCN-films could be deposited on hard metal and steel substrates. The plasma was generated by a DC-pulse power supply with frequencies up to 50 kHz. The reactor size was 350 mm in diameter and 900 mm in height. During one batch 1200 indexable inserts could be coated. The growth rates were about 1-3 μm h-1. The deposited films show a fine structure and Cl-concentrations below 3%. The measured critical loads were between 30 and 40 N. Wear test results show an increase in tool life up to several 100% compared with uncoated or TiN-coated tools.

KW - AlN

KW - Industrial PACVD

KW - Pulsed d.c. plasma

KW - Ti

KW - TiAlCN

UR - http://www.scopus.com/inward/record.url?scp=0001197067&partnerID=8YFLogxK

U2 - 10.1016/S0257-8972(97)00303-4

DO - 10.1016/S0257-8972(97)00303-4

M3 - Article

AN - SCOPUS:0001197067

SN - 0257-8972

VL - 98

SP - 1553

EP - 1556

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 1-3

ER -

TiAlN and TiAlCN deposition in an industrial PaCVD-plant

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this