TiAlN and TiAlCN deposition in an industrial PaCVD-plant

D. Heim, R. Hochreiter

Research output: Contribution to journalArticlepeer-review

55 Citations (Scopus)


An industrial PaCVD-plant was equipped with an AlQ3-generator. By using Ar, H2, N2, CH4, TiCl4 and AlCl3, TiAlN- and TiAlCN-films could be deposited on hard metal and steel substrates. The plasma was generated by a DC-pulse power supply with frequencies up to 50 kHz. The reactor size was 350 mm in diameter and 900 mm in height. During one batch 1200 indexable inserts could be coated. The growth rates were about 1-3 μm h-1. The deposited films show a fine structure and Cl-concentrations below 3%. The measured critical loads were between 30 and 40 N. Wear test results show an increase in tool life up to several 100% compared with uncoated or TiN-coated tools.

Original languageEnglish
Pages (from-to)1553-1556
Number of pages4
JournalSurface and Coatings Technology
Issue number1-3
Publication statusPublished - Jan 1998
Externally publishedYes


  • AlN
  • Industrial PACVD
  • Pulsed d.c. plasma
  • Ti
  • TiAlCN


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