Stimulated Emission Depletion Lithography with Mercapto-Functional Polymers

Bianca Buchegger, Johannes Kreutzer, Birgit Plochberger, Richard Wollhofen, Jaroslaw Jacak, Gerhard Schütz, Ulrich Schubert, Thomas Klar, Dmitry Sivun

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49 Citations (Scopus)

Abstract

Surface reactive nanostructures were fabricated using stimulated emission depletion (STED) lithography. The functionalization of the nanostructures was realized by copolymerization of a bifunctional metal oxo cluster in the presence of a triacrylate monomer. Ligands of the cluster surface cross-link to the monomer during the lithographic process, whereas unreacted mercapto functionalized ligands are transferred to the polymer and remain reactive after polymer formation of the surface of the nanostructure. The depletion efficiency in dependence of the cluster loading was investigated and full depletion of the STED effect was observed with a cluster loading exceeding 4 wt %. A feature size by λ/11 was achieved by using a donut-shaped depletion beam. The reactivity of the mercapto groups on the surface of the nanostructure was tested by incubation with mercapto-reactive fluorophores.

Original languageEnglish
Pages (from-to)1954-1959
Number of pages6
JournalACS Nano
Volume10
Issue number2
DOIs
Publication statusPublished - 23 Feb 2016

Keywords

  • STED lithography
  • functional polymers
  • thiol polymers
  • zirconium oxo cluster polymerization

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