Sputtering of fullerene by noble gas ions at high fluences

D. Fink, M. Müller, R. Klett, L. T. Chadderton, L. Palmetshofer, J. Kastner, J. Vacik, V. Hnatowicz, P. Popok

Research output: Contribution to journalArticlepeer-review

17 Citations (Scopus)


Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

Original languageEnglish
Pages (from-to)415-422
Number of pages8
JournalNuclear Inst. and Methods in Physics Research, B
Issue number4
Publication statusPublished - 1 Dec 1995
Externally publishedYes


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