TY - GEN
T1 - Spectroscopic ellipsometry as a tool for on-line monitoring and control of surface treatment processes
AU - Eitzinger, C.
AU - Fikar, J.
AU - Forsich, C.
AU - Humliček, J.
AU - Krüger, A.
AU - Kullmer, R.
AU - Laimer, J.
AU - Lingenhöle, E.
AU - Lingenhöle, K.
AU - Mühlberger, M.
AU - Müller, T.
AU - Störi, H.
AU - Wielsch, U.
PY - 2006
Y1 - 2006
N2 - Modern material technology relies increasingly on processes for surface modification and coating. Generally, we are lacking a possibility to monitor the progress of such processes. Thus the outcome can only be analyzed after the end of the whole process cycle. We are proposing to use spectroscopic ellipsometry (SE) as an on-line monitoring tool. SE, as an optical method, is not affected by high temperatures, process gases, plasmas, etc. It can be used as a monitoring tool or a sensor for closed loop control of processes. The main difficulty is the on-line interpretation of SE data. Depending on the nature of the process monitored or controlled, different models are used for the interpretation. These models predict the SE response depending on different parameters describing the surface under investigation. A fitting process is used to solve the inverse problem, i.e. extracting material data from the SE spectra. We expect increased process stability and shorter development time as a practical benefit from the use of SE.
AB - Modern material technology relies increasingly on processes for surface modification and coating. Generally, we are lacking a possibility to monitor the progress of such processes. Thus the outcome can only be analyzed after the end of the whole process cycle. We are proposing to use spectroscopic ellipsometry (SE) as an on-line monitoring tool. SE, as an optical method, is not affected by high temperatures, process gases, plasmas, etc. It can be used as a monitoring tool or a sensor for closed loop control of processes. The main difficulty is the on-line interpretation of SE data. Depending on the nature of the process monitored or controlled, different models are used for the interpretation. These models predict the SE response depending on different parameters describing the surface under investigation. A fitting process is used to solve the inverse problem, i.e. extracting material data from the SE spectra. We expect increased process stability and shorter development time as a practical benefit from the use of SE.
KW - Closed loop control
KW - Nitriding
KW - On-line monitor
KW - Spectroscopic ellipsometry
KW - Surface treatment
UR - http://www.scopus.com/inward/record.url?scp=37849017860&partnerID=8YFLogxK
U2 - 10.4028/www.scientific.net/msf.518.423
DO - 10.4028/www.scientific.net/msf.518.423
M3 - Conference contribution
AN - SCOPUS:37849017860
SN - 9780878494057
T3 - Materials Science Forum
SP - 423
EP - 430
BT - Recent Developments in Advanced Materials and Processes - Selected Papers presented at the 7th Conference of the Yugoslav Materials Research Society
PB - Trans Tech Publications Ltd
T2 - 7th Conference of the Yugoslav Materials Research Society - Recent Developments in Advanced Materials and Processes, YUCOMAT VII
Y2 - 12 September 2005 through 16 September 2005
ER -