Optimized sampling for view interpolation in light fields with overlapping patches

D.C. Schedl, Oliver Bimber

Research output: Chapter in Book/Report/Conference proceedingsConference contributionpeer-review


Optimized sampling masks that reduce the complexity of camera arrays while preserving the quality of light fields captured at high directional sampling resolution are presented. We propose a new quality metric that is based on sampling-theoretic considerations, a new mask estimation approach that reduces the search space by applying regularity and symmetry constraints, and an enhanced upsampling technique using compressed sensing that supports maximal patch overlap. Our approach out-beats state-of-the-art view-interpolation techniques for light fields and does not rely on depth reconstruction.

Original languageEnglish
Title of host publicationEuropean Association for Computer Graphics - 39th Annual Conference, EUROGRAPHICS 2018 - Short Papers
Number of pages4
Publication statusPublished - 2018
Externally publishedYes


Dive into the research topics of 'Optimized sampling for view interpolation in light fields with overlapping patches'. Together they form a unique fingerprint.

Cite this