Focal spot optimization through scattering media in multiphoton lithography

B. Buchegger; A. Haghofer; D. Höglinger; J. Jacak; S. Winkler; A. Hochreiner

doi:10.1016/j.optlaseng.2021.106607

Focal spot optimization through scattering media in multiphoton lithography

B. Buchegger, A. Haghofer, D. Höglinger, J. Jacak, S. Winkler, A. Hochreiner

Research output: Contribution to journal › Article › peer-review

2 Citations (Scopus)

Abstract

Shaping the optical wavefront utilizing spatial light modulators (SLMs) is a valuable methodology for modification of a focal spot. It has numerous applications in microscopy, particularly in scattering media. Optical lithography techniques, i.e. multiphoton lithography, can also benefit from wavefront shaping. In this contribution, we present focus optimization in multiphoton lithography through a scattering medium. Beam shaping of a femtosecond-pulsed laser pulse was achieved using a liquid-crystal SLM. For the feedback system a low-cost approach, using a Raspberry Pi-camera in Bayer-mode was applied. Images of the focal spot were used as input for an evolutionary algorithm to improve focus quality.

Original language	English
Article number	106607
Journal	Optics and Lasers in Engineering
Volume	142
DOIs	https://doi.org/10.1016/j.optlaseng.2021.106607
Publication status	Published - Jul 2021

Keywords

Bayer-mode
Beam shaping
Femtosecond laser
Machine learning
Spatial light modulator

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10.1016/j.optlaseng.2021.106607

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abstract = "Shaping the optical wavefront utilizing spatial light modulators (SLMs) is a valuable methodology for modification of a focal spot. It has numerous applications in microscopy, particularly in scattering media. Optical lithography techniques, i.e. multiphoton lithography, can also benefit from wavefront shaping. In this contribution, we present focus optimization in multiphoton lithography through a scattering medium. Beam shaping of a femtosecond-pulsed laser pulse was achieved using a liquid-crystal SLM. For the feedback system a low-cost approach, using a Raspberry Pi-camera in Bayer-mode was applied. Images of the focal spot were used as input for an evolutionary algorithm to improve focus quality.",

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AU - Haghofer, A.

AU - Höglinger, D.

AU - Jacak, J.

AU - Winkler, S.

AU - Hochreiner, A.

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Focal spot optimization through scattering media in multiphoton lithography

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Keywords

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