Deposition of TiAIN and TiAICN by PACVD

D. Heim, R. Hochreiter

Research output: Contribution to journalConference articlepeer-review


TiAIN and TiAICN were deposited on hard metal and steel substrates by a PaCVD-process. The process gases were Ar, H2, N2, AlCl3, and CH4. As plasma source a Ruebig micropulse generator was used. The size of the reactor was 350mm in diameter and 700mm in height. During one batch 1200 indexable inserts (12mm × 12mm) had been homogeneously coated. The growth rate was 1 - 3 μm/h. The TiAIN and TiAICN films show a fine structure and a good homogeneity also around sharp edges. Wear tests demonstrate an increase in life time up to several 100% compared to uncoated or TiN-coated tools, especially at higher cutting speeds.

Original languageEnglish
Pages (from-to)243-245
Number of pages3
JournalVide: Science, Technique et Applications
Publication statusPublished - 1996
Externally publishedYes
EventProceedings of the 1996 5th International Symposium on Trends and New Applications in Thin Films, TATF'96 - Colmar, Fr
Duration: 1 Apr 19963 Apr 1996


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