Deposition of N, F and O-doped Amorphous Carbon-Silicon Coatings in an Industrial DC-PACVD-System

Translated title of the contribution: Deposition of N, F and O-doped Amorphous Carbon-Silicon Coatings in an Industrial DC-PACVD-System

Daniel Heim, Christian Forsich, Thomas Müller, Andreas Gebeshuber

Research output: Chapter in Book/Report/Conference proceedings › Conference contribution

Translated title of the contribution	Deposition of N, F and O-doped Amorphous Carbon-Silicon Coatings in an Industrial DC-PACVD-System
Original language	German
Title of host publication	14th International Conference on Plasma Surface Engineering
Publication status	Published - 2014
Event	12th International Conference on Plasma Surface Engineering - Garmisch-Partenkirchen, Germany Duration: 15 Sept 2014 → 19 Sept 2014

Conference	12th International Conference on Plasma Surface Engineering
Country/Territory	Germany
City	Garmisch-Partenkirchen
Period	15.09.2014 → 19.09.2014

Cite this

@inproceedings{e7ce972061ef42f8a2f17b4b7d54e065,

title = "Deposition of N, F and O-doped Amorphous Carbon-Silicon Coatings in an Industrial DC-PACVD-System",

author = "Daniel Heim and Christian Forsich and Thomas M{\"u}ller and Andreas Gebeshuber",

year = "2014",

language = "Deutsch",

booktitle = "14th International Conference on Plasma Surface Engineering",

note = "12th International Conference on Plasma Surface Engineering ; Conference date: 15-09-2014 Through 19-09-2014",

}

TY - GEN

T1 - Deposition of N, F and O-doped Amorphous Carbon-Silicon Coatings in an Industrial DC-PACVD-System

AU - Heim, Daniel

AU - Forsich, Christian

AU - Müller, Thomas

AU - Gebeshuber, Andreas

PY - 2014

Y1 - 2014

M3 - Konferenzbeitrag

BT - 14th International Conference on Plasma Surface Engineering

T2 - 12th International Conference on Plasma Surface Engineering

Y2 - 15 September 2014 through 19 September 2014

ER -