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Characterization of buried K-fulleride layers formed by ion implantation
L. Palmetshofer
*
, M. Geretschläger
,
J. Kastner
, H. Kuzmany
, K. Piplits
*
Corresponding author for this work
Research output
:
Contribution to journal
›
Article
›
peer-review
7
Citations (Scopus)
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Keyphrases
Ion Implantation
100%
Fullerides
100%
X-ray
50%
Diffraction
50%
Amorphous Carbon
50%
Raman Scattering
50%
Implantation Temperature
50%
C60 Films
25%
Cm(III)
25%
Carbon Surface
25%
Phase Diagram
25%
Surface Layer
25%
Phase Diffusion
25%
Thermodynamic Process
25%
Depth Profile
25%
Rutherford Backscattering Spectrometry
25%
Phase Formation
25%
Implanted Ions
25%
Fullerene Molecules
25%
Passivation Effect
25%
Grazing Angle
25%
Scattering Angle
25%
Amorphous Carbon Layer
25%
Phase Characterization
25%
Secondary Ion Mass Spectrometry
25%
Dose-ranging
25%
Local Maxima
25%
Scattered Rays
25%
Chemistry
Ion Implantation
100%
Fullerides
100%
formation
75%
Raman Spectra
50%
Chemical Passivation
25%
Implanted Ion
25%
Secondary Ion Mass Spectroscopy
25%
Rutherford Backscattering Spectroscopy
25%
Implant
25%
Potassium Ion
25%
Fullerene
25%
Phase Diagrams
25%
Thermodynamics
25%
Material Science
Fulleride
100%
Ion Implantation
100%
Film
75%
Amorphous Carbon
75%
Fullerene
25%
Carbon Surface
25%
Secondary Ion Mass Spectrometry
25%
Rutherford Backscattering Spectrometry
25%