CCD based emissivity measurements for surface characterization in heat treatment processes

Keyphrases

• Plasma Nitriding 100%
• Surface Modification 100%
• Heat Treatment Process 100%
• Light Intensity 100%
• Emissivity 100%
• Surface Characterization 100%
• Emissivity Measurement 100%
• Material Properties 50%
• Device-independent 50%
• CCD Camera 50%
• Nitriding Process 50%
• Spectral Bands 50%
• Process Control 50%
• Improved Process 50%
• Measurement System 50%
• Metal Parts 50%
• Near-infrared 50%
• Pyrometry 50%
• Thermochemical Heat Treatment 50%
• Metal Surface 50%
• Spectral Sensitivity 50%
• Surface Hardening 50%
• Spectral Range 50%
• Imaging Device 50%
• Gray-body 50%
• Relative Sensitivity 50%
• Spectral Changes 50%
• Light Spectrum 50%
• Low Process Temperature 50%
• In-line Characterization 50%
• Nitrogen Atom 50%
• Low-cost Device 50%
• Spectral Intensity 50%
• Hardening Process 50%
• Industrial Surfaces 50%

Material Science

• Nitriding 100%
• Surface Treatment 100%
• Heat Treatment 100%
• Surface Characterization 100%
• Materials Property 50%
• Process Control 50%
• Metal Surface 50%
• Surface Hardening 50%

Engineering

• Nitrogen Atom 33%