TiAlN and TiAlCN deposition in an industrial PaCVD-plant

Keyphrases

• Alq3 50%
• Aluminum Chloride 50%
• Ar-H2 50%
• DC Pulse 50%
• Deposited Film 50%
• Frequency up 50%
• Growth Rate 50%
• Hard Steel 50%
• Hardmetal 50%
• Indexable Inserts 50%
• Metal Substrate 50%
• Pulsed Power Supply 50%
• Reactor Size 50%
• Steel Substrate 50%
• TiAlCN 100%
• TiAlN 100%
• TiN Coated Tools 50%
• Titanium Tetrachloride 50%
• Tool Life 50%
• Wear Test 50%

Engineering

• Coated Tool 100%
• Critical Load 100%
• Deposited Film 100%
• Methane 100%
• Power Supply 100%
• Test Result 100%