Sputtering of fullerene by noble gas ions at high fluences

D. Fink; M. Müller; R. Klett; L. T. Chadderton; L. Palmetshofer; J. Kastner; J. Vacik; V. Hnatowicz; P. Popok

doi:10.1016/0168-583X(95)00662-1

Sputtering of fullerene by noble gas ions at high fluences

D. Fink^*
, M. Müller
, R. Klett
, L. T. Chadderton
, L. Palmetshofer
, J. Kastner
, J. Vacik
, V. Hnatowicz
, P. Popok

^*Korrespondierende/r Autor/-in für diese Arbeit

Publikation: Beitrag in Fachzeitschrift › Artikel › Begutachtung

17 Zitate (Scopus)

Abstract

Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

Originalsprache	Englisch
Seiten (von - bis)	415-422
Seitenumfang	8
Fachzeitschrift	Nuclear Inst. and Methods in Physics Research, B
Jahrgang	103
Ausgabenummer	4
DOIs	https://doi.org/10.1016/0168-583X(95)00662-1
Publikationsstatus	Veröffentlicht - 1 Dez. 1995
Extern publiziert	Ja

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10.1016/0168-583X(95)00662-1

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title = "Sputtering of fullerene by noble gas ions at high fluences",

abstract = "Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.",

author = "D. Fink and M. M{\"u}ller and R. Klett and Chadderton, \{L. T.\} and L. Palmetshofer and J. Kastner and J. Vacik and V. Hnatowicz and P. Popok",

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doi = "10.1016/0168-583X(95)00662-1",

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T1 - Sputtering of fullerene by noble gas ions at high fluences

AU - Fink, D.

AU - Müller, M.

AU - Klett, R.

AU - Chadderton, L. T.

AU - Palmetshofer, L.

AU - Kastner, J.

AU - Vacik, J.

AU - Hnatowicz, V.

AU - Popok, P.

PY - 1995/12/1

Y1 - 1995/12/1

N2 - Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

AB - Noble gas ions have been implanted into fullerene in the solid state up to fluences which far exceed the molecular destruction threshold. The corresponding depth profile peaks in Rutherford backscattering experiments move strongly towards the surface signal with increasing fluence. This suggests a high degree of target erosion due to collisional sputtering. One consequence of this process can be an interesting and basic effect on the nature of the fullerene destruction products.

UR - https://www.scopus.com/pages/publications/0001079111

U2 - 10.1016/0168-583X(95)00662-1

DO - 10.1016/0168-583X(95)00662-1

M3 - Article

AN - SCOPUS:0001079111

SN - 0168-583X

VL - 103

SP - 415

EP - 422

JO - Nuclear Inst. and Methods in Physics Research, B

JF - Nuclear Inst. and Methods in Physics Research, B

IS - 4

ER -

Sputtering of fullerene by noble gas ions at high fluences

Abstract

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