Simulation of plasma resonances in MOSFETs for THz-signal detection

Christoph Jungemann, K. Bittner, H. G. Brachtendorf

Publikation: Beitrag in Buch/Bericht/TagungsbandKonferenzbeitragBegutachtung

7 Zitate (Scopus)

Abstract

We present simulations by the 2D drift-diffusion model of a quarter-micron NMOSFET at THz frequencies. The derivative of the current densities with respect to time is included in the model, which enables simulations of plasma oscillations. In contrast to the usual 1D transmission line models this approach includes all 2D effects of the device (parasitics, inhomogeneous channel, etc.). In the case of silicon the impact of plasma oscillations is found to be negligible due to the strong damping. With respect to numerics it is found that the backward differentiation formula based on trigonometric functions is very efficient for simulation of the periodic steady-state.

OriginalspracheEnglisch
Titel2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2016
Herausgeber (Verlag)Institute of Electrical and Electronics Engineers Inc.
Seiten48-51
Seitenumfang4
ISBN (elektronisch)9781467386098
DOIs
PublikationsstatusVeröffentlicht - 23 März 2016
Veranstaltung2nd Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2016 - Vienna, Österreich
Dauer: 25 Jän. 201627 Jän. 2016

Publikationsreihe

Name2016 Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2016

Konferenz

Konferenz2nd Joint International EUROSOI Workshop and International Conference on Ultimate Integration on Silicon, EUROSOI-ULIS 2016
Land/GebietÖsterreich
OrtVienna
Zeitraum25.01.201627.01.2016

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