Deposition of TiAIN and TiAICN by PACVD

D. Heim, R. Hochreiter

Publikation: Beitrag in FachzeitschriftKonferenzartikelBegutachtung


TiAIN and TiAICN were deposited on hard metal and steel substrates by a PaCVD-process. The process gases were Ar, H2, N2, AlCl3, and CH4. As plasma source a Ruebig micropulse generator was used. The size of the reactor was 350mm in diameter and 700mm in height. During one batch 1200 indexable inserts (12mm × 12mm) had been homogeneously coated. The growth rate was 1 - 3 μm/h. The TiAIN and TiAICN films show a fine structure and a good homogeneity also around sharp edges. Wear tests demonstrate an increase in life time up to several 100% compared to uncoated or TiN-coated tools, especially at higher cutting speeds.

Seiten (von - bis)243-245
FachzeitschriftVide: Science, Technique et Applications
PublikationsstatusVeröffentlicht - 1996
Extern publiziertJa
VeranstaltungProceedings of the 1996 5th International Symposium on Trends and New Applications in Thin Films, TATF'96 - Colmar, Fr
Dauer: 1 Apr. 19963 Apr. 1996


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