CCD camera-based analysis of thin film growth in industrial PACVD processes

Keyphrases

• Plasma-assisted Chemical Vapor Deposition (PACVD) 100%
• CCD Camera 100%
• Camera-based 100%
• Thin Film Growth 100%
• Growth Characteristics 66%
• Near-infrared 66%
• Thermal Radiation 66%
• Semitransparent 33%
• Spatiotemporal Analysis 33%
• Visible Spectrum 33%
• Interference Effect 33%
• Electromagnetic Spectrum 33%
• CCD Sensor 33%
• Light Emission 33%
• Image Formation 33%
• Emissivity 33%
• Bandpass Filter 33%
• Transparent Thin Film 33%
• Thermal Imaging Device 33%
• Plasma Discharge 33%
• Si CCDs 33%
• Relative Growth Rate 33%
• Signal Variation 33%
• Spectral Sensitivity 33%
• Central Wavelength 33%
• Process Plasma 33%

Engineering

• Thin Film Growth 100%
• Thermal Radiation 66%
• Assisted Chemical Vapor Deposition 33%
• Image Formation 33%
• Bandpass Filter 33%
• Relative Growth Rate 33%
• Light Emission 33%
• Emissivity 33%

Material Science

• Thin Film Growth 100%
• Chemical Vapor Deposition 33%