120 nm resolution and 55nm line width achieved in visible light STED-lithography

Jaroslaw Jacak, Richard Wollhofen, Thomas Klar

Publikation: Beitrag in Buch/Bericht/TagungsbandKonferenzbeitragBegutachtung

Abstract

STED (stimulated emission depletion) nanoscopy[1, 2] has proven to provide even sub-10 nm resolution[3] in far field fluorescence microscopy and has found ample applications in biology or materials science. Similar to the development two-photon lithography[4] out of the concept of two-photon microscopy, it was proposed already in the very first reports on STED nanoscopy that the confined effective excitation volume can be used to spatially define chemical reactions on the nanometre scale.[1, 2] STED-inspired diffraction-unlimited lithography has been experimentally verified recently.[5-7]

OriginalspracheEnglisch
TitelThe European Conference on Lasers and Electro-Optics, CLEO_Europe 2013
DOIs
PublikationsstatusVeröffentlicht - 2013
VeranstaltungThe European Conference on Lasers and Electro-Optics, CLEO_Europe 2013 - Munich, Deutschland
Dauer: 12 Mai 201316 Mai 2013

Publikationsreihe

NameOptics InfoBase Conference Papers
ISSN (elektronisch)2162-2701

Konferenz

KonferenzThe European Conference on Lasers and Electro-Optics, CLEO_Europe 2013
Land/GebietDeutschland
OrtMunich
Zeitraum12.05.201316.05.2013

Fingerprint

Untersuchen Sie die Forschungsthemen von „120 nm resolution and 55nm line width achieved in visible light STED-lithography“. Zusammen bilden sie einen einzigartigen Fingerprint.

Zitieren